Shower Type
Overview
- Running water excited by high-frequency ultrasound removes contaminant paricles on glass and silicon wafer
- Continuous supply of clean running water eliminates the possibility of recontamination.
- High frequency vibration removes submicron particle instantly without damaging safers.
- The particle less than 0.2 micro meters can be removed.
Specification
| Type | ULMS-100 | ULMS-200 | ULMS-400 | ULMS-600 |
|---|---|---|---|---|
| Effective cleaning range(W*D mm) | 100*2 | 200*2 | 400*2 | 600*2 |
| Nozzie dimension(W*L*H mm) | 199*65*53 | 282*132*65 | 482*132*65 | 682*132*65 |
| Cozzle weigh | 0.6kg | 3kg | 5kg | 5.8kg |
| Water flow rate | 7L/min | 18L/min | 35L/min | 45L/min |
| Output power | 150W | 300W | 600W | 750W |
| Oscillation Frequency | 1MHz | |||
| Wafer inlet | 1/2 inch elbow | Liquid contact material | Polypropylene, Trantalum, VITON | |
*Custom spec size will also be available upon customer request
